Lithographic apparatus and device manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8208120
APP PUB NO 20080218726A1
SERIAL NO

12078997

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Abstract

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In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Smit Joannes Theodoor Eindhoven, NL 50 5946
Derksen, Antonius Theodorus Anna Maria Eindhoven, NL 56 3384
Donders, Sjoerd Nicolaas Lambertus ′s-Hertogenbosch, NL 253 8312
Hoogendam, Christiaan Alexander Veldhoven, NL 205 9950
Kolesnychenko, Aleksey Helmond, NL 35 3183
Lof, Joeri Eindhoven, NL 94 8170
Loopstra, Erik Roelof Heeze, NL 325 13468
Modderman, Theodorus Marinus Neunen, NL 39 4357
Mulkens, Johannes Catharinus Hubertus Maastricht, NL 213 10886
Ritsema, Roelof Aeilko Siebrand Eindhoven, NL 37 4991
Simon, Klaus Eindhoven, NL 89 7360
Straaijer, Alexander Eindhoven, NL 87 8017
Streefkerk, Bob Tilburg, NL 201 10575
Van, Santen Helmar Amsterdam, NL 101 4784

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