US Patent No: 8,216,745
Number of patents in Portfolio can not be more than 2000
Half-tone mask, half-tone mask blank and method for manufacturing half-tone mask
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Jul 10, 2012
Issued date -
Oct 29, 2008
filing date -
12/740,645
serial no -
In Force
status
Importance
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Abstract
A halftone mask increasing the versatility of an etching stopper layer. The half tone mask (10) is provided with a transparent portion (TA) using a glass substrate (S), a first semi-transparent portion (HA) including a first semi-transparent layer (11) formed on the glass substrate, and a light shield portion (PA) including a first semi-transparent portion, a light shield layer (13) superimposed above the first semi-transparent layer, and an etching stopper layer (12) formed between the first semi-transparent layer and the light shield layer. The first semi-transparent layer and the light shield layer are each formed from Cr or at least one selected from the group consisting of an oxide, nitride, carbide, oxynitride, oxycarbide, carbonitride, and oxycarbonitride of Cr. The etching stopper layer includes a first element of at least one selected from the group consisting of Fe, Ni, and Co and a second element of at least one selected from the group consisting of Al, Si, Ti, Nb, Ta, Hf, and Zr.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
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| 2007/0076,833 Attenuated phase shift mask blank and photomask | 2 | 2004 | |
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| 2006/0088,774 Photomask blank, photomask and fabrication method thereof | 8 | 2005 | |
Patent Citation Ranking
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