Particle monitor system and substrate processing apparatus
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United States of America Patent
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Jul 10, 2012
Grant Date -
Sep 8, 2011
app pub date -
May 19, 2011
filing date -
Jan 30, 2007
priority date (Note) -
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Abstract
A particle monitor system that can detect fine particles in a substrate processing apparatus. The substrate processing apparatus has a chamber in which a substrate is housed and subjected to processing, a dry pump that exhausts gas out of the chamber, and a bypass line that communicates the chamber and the dry pump together. The particle monitor system has a laser light oscillator that irradiates laser light toward a space in which the particles may be present, and a laser power measurement device that is disposed on an optical path of the laser light having passed through the space and measures the energy of the laser light.
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