Diaphragm isolation forming through subtractive etching
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United States of America Patent
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-
Aug 14, 2012
Grant Date -
Apr 16, 2009
app pub date -
Oct 15, 2007
filing date -
Oct 15, 2007
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Described herein is a housing comprising an inside and at least one sidewall, wherein the at least one sidewall comprises inner and outer surfaces. An etch stop deposit is disposed over at least a portion of the housing, and a diaphragm material deposit is disposed over at least a portion of the etch stop deposit.
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