Methods for nanowire alignment and deposition

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United States of America Patent

PATENT NO 8252164
APP PUB NO 20110284380A1
SERIAL NO

13113680

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Abstract

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The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.

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Patent Owner(s)

  • ONED MATERIAL LLC;SHARP KABUSHIKI KAISHA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Duan, Xiangfeng Mountain View, US 90 4054
Fujii, Katsumasa Yamatokoriyama, JP 15 597
Hamilton, James M Sunnyvale, US 37 1453
Iwata, Hiroshi Nara, JP 351 5495
Leon, Francisco Palo Alto, US 32 521
Martin, Samuel Cupertino, US 26 216
Miller, Jeffrey Los Altos Hills, US 95 1825
Negishi, Tetsu Sunnyvale, US 15 431
Ohki, Hiroshi Tokyo, JP 76 1712
Okada, Yasunobu Gifu, JP 6 104
Parce, J Wallace Palo Alto, US 200 19047
Pereira, Cheri X Y Fremont, US 5 162
Schuele, Paul John Washougal, US 13 221
Shibata, Akihide Santa Clara, US 109 1541
Stumbo, David P Belmont, US 62 2703

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