Method of using xenon ion beams to improve track width definition
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United States of America Patent
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Sep 4, 2012
Grant Date -
Feb 21, 2008
app pub date -
Oct 18, 2007
filing date -
Apr 20, 2004
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Abstract
Using a beam of xenon ions together with a suitable mask, a stack is ion milled until a part of it, no more than about 0.1 microns thick, has been removed so that a pedestal having sidewalls, including a vertical section and a shortened taper portion, has been formed. This is followed by formation of conductive lead layers as needed. Using xenon as the sputtering gas enables the point at which milling is terminated to be more precisely controlled.
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