Particle beam writing method, particle beam writing apparatus and maintenance method for same
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United States of America Patent
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Sep 4, 2012
Grant Date -
Apr 29, 2010
app pub date -
Oct 26, 2009
filing date -
Oct 24, 2008
priority date (Note) -
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Abstract
A first exposure dose for a shot area based upon layout data is determined. A correction dose compensating a dose deviation between a first point in time, at which a control unit configured to control a shot time period of a particle beam writing apparatus considers a charged particle beam as having reached a nominal current density, and a second point in time, at which the charged particle beam has actually reached a nominal current density, at a target substrate is determined.
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