Substrate processing apparatus

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United States of America Patent

PATENT NO 8272826
APP PUB NO 20090035103A1
SERIAL NO

12144680

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate processing apparatus includes first and second transfer chambers, first and second load lock chambers for exchanging one or more substrates with respective ones of first and the second transfer chambers, and a substrate transfer unit, located between the first and second load lock chambers, for transferring the one or more substrates to the first and second load lock chambers.

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Patent Owner(s)

Patent OwnerAddress
ADVANCED DISPLAY PROCESS ENGINEERING CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeong, Won Ki Seongnam-si, KR 6 791
Jo, Cheol Rae Seoul, KR 3 4
Park, Jang-Wan Yongin-si, KR 1 2

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