Patterned wafer inspection system using a non-vibrating contact potential difference sensor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 25, 2012
Grant Date -
Aug 5, 2010
app pub date -
Jan 26, 2010
filing date -
Feb 3, 2009
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and system for inspecting a surface of a material having a repeating pattern of relative work function. The method and system processes sensor data to identify data characteristic of the repeating pattern, and the sensor data is then further processed to remove the data characteristic of the repeating data, leading to a characteristic of non-uniformities of the material surface.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully