High uniformity boron doped diamond material
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United States of America Patent
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Oct 2, 2012
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N/A
app pub date -
Jan 22, 2008
filing date -
Jan 22, 2007
priority date (Note) -
Expired
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Abstract
The present invention relates to diamond material comprising a boron doped single crystal diamond substrate layer having a first surface and a boron doped single crystal diamond conductive layer on said first surface, wherein the distribution of boron in the conductive layer is more uniform than the distribution of boron in the substrate layer.
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