Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
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United States of America Patent
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Oct 16, 2012
Grant Date -
Oct 23, 2008
app pub date -
Apr 11, 2008
filing date -
Apr 17, 2007
priority date (Note) -
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Abstract
The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The present invention provides a clad textured metal substrate for forming the epitaxial thin film thereon, which includes a metallic layer and a silver layer bonded to at least one face of the metallic layer, wherein the silver layer has a {100}<001> cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦9 degree. The textured metal substrate can be manufactured by subjecting the silver sheet containing 30 to 200 ppm oxygen by concentration to the orienting treatment of hot-working and heat-treating, and bonding the metal sheet with the oriented silver sheet by using a surface activated bonding process.
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