Surface profile sensor and method for manufacturing the same
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United States of America Patent
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Oct 23, 2012
Grant Date -
Dec 17, 2009
app pub date -
Aug 26, 2009
filing date -
Apr 5, 2007
priority date (Note) -
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Abstract
A surface profile sensor includes an interlayer insulating film provided with a planarized upper surface formed above a semiconductor substrate, a detection electrode film formed on the interlayer insulating film, an upper insulating film formed on the detection electrode film and the interlayer insulating film and including the surface on which a silicon nitride film is exposed, and a protection insulating film deposited on the upper insulating film and made of a tetrahedral amorphous carbon (ta-C) film including a window formed on the detection electrode film.
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