Removal of metal contaminant deposited on quartz member of vertical heat processing apparatus
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United States of America Patent
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Oct 30, 2012
Grant Date -
Dec 3, 2009
app pub date -
Apr 28, 2009
filing date -
May 29, 2008
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method is used for removing a metal contaminant deposited on a quartz member selected from the group consisting of a reaction tube, wafer boat, and heat-insulating cylinder of a vertical heat processing apparatus for a semiconductor process. The method includes obtaining the quartz member unattached to the vertical heat processing apparatus; then, performing diluted hydrofluoric acid cleaning of cleaning the quartz member by use of diluted hydrofluoric acid; then, performing first purified water cleaning of cleaning the quartz member by use of purified water; then, performing hydrochloric acid cleaning of cleaning the quartz member by use of hydrochloric acid; and then, performing second purified water cleaning of cleaning the quartz member by use of purified water.
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