Quartz window having gas feed and processing equipment incorporating same
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United States of America Patent
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Oct 30, 2012
Grant Date -
Oct 21, 2010
app pub date -
Apr 14, 2010
filing date -
Apr 20, 2009
priority date (Note) -
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status (Latency Note)
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Abstract
Methods and apparatus for providing a process gas to a substrate in a processing system are disclosed herein. In some embodiments, the substrate processing system may include a process chamber having a substrate support disposed therein; a light source disposed above the process chamber to direct energy towards the substrate support; and a window assembly disposed between the light source and the substrate support to allow light energy provided by the light source to enter the process chamber towards the substrate support, wherein the window assembly includes an inlet to receive a process gas and one or more outlets to distribute the process gas into the process chamber.
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