Imprint template, nanoimprint device and nanostructuring method
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United States of America Patent
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Nov 6, 2012
Grant Date -
May 19, 2011
app pub date -
Nov 8, 2010
filing date -
Nov 6, 2009
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Imprint templates for use in nanoimprint lithography methods, a nanoimprint device suitable for UV nanoimprint lithography methods and a nanostructuring method for direct structuring of a UV-sensitive imprint material on a substrate are provided. The imprint templates, nanoimprint device and nanostructuring method can be used both for ultraviolet nanoimprint lithography and for thermal nanoimprint lithography. The imprint template includes a nontransparent structured chip and a transparent substrate. An at least partially nontransparent imprint template as well as a UV source situated above the imprint template holder are used for structuring by indirect exposure by reflection of light emitted from the UV radiation source in the direction of a photoactive layer.
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