Method for making micro-electro-mechanical system device
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United States of America Patent
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Nov 6, 2012
Grant Date -
May 13, 2010
app pub date -
Nov 13, 2008
filing date -
Nov 13, 2008
priority date (Note) -
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Abstract
The present invention discloses a method for making a MEMS device, comprising: providing a zero-layer substrate; forming a MEMS device region on the substrate, wherein the MEMS device region is provided with a first sacrificial region to separate a suspension structure of the MEMS device from another part of the MEMS device; removing the first sacrificial region by etching; and micromachining the zero-layer substrate.
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