Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings

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United States of America Patent

PATENT NO 8309496
APP PUB NO 20120071361A1
SERIAL NO

13273399

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Abstract

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The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.

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Patent Owner(s)

  • AFFYMETRIX, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Diggelman, Martin Nierdorf, CH 12 468
Goldberg, Martin J Saratoga, US 50 1325
Hubbell, Earl A Palo Alto, US 42 2055
McGall, Glenn H Palo Alto, US 95 1834
Morris, MacDonald Felton, US 24 677
Ngo, Nam Quoc Campbell, US 15 477
Rava, Richard P Redwood City, US 131 12158
Tan, Jennifer Newark, US 12 468
Yamamoto, Melvin Fremont, US 28 278

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