Coating and developing apparatus, substrate processing method, and storage medium

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8313257
APP PUB NO 20110211825A1
SERIAL NO

13103290

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Shinichi Koshi, JP 211 2964
Hayashida, Yasushi Koshi, JP 34 842
Matsuoka, Nobuaki Koshi, JP 59 1231

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