Multi-stage substrate cleaning method and apparatus
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United States of America Patent
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Nov 27, 2012
Grant Date -
Nov 18, 2010
app pub date -
May 13, 2009
filing date -
May 13, 2009
priority date (Note) -
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status (Latency Note)
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Abstract
A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
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