Positive typed photosensitive composition

United States of America Patent

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Nov 27, 2012
Grant Date
Jul 28, 2011
app pub date
Aug 26, 2010
filing date
Jan 22, 2010

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Expired

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Abstract

Disclosed is a photosensitive resin composition, comprising 0.1 to 20 parts by weight of a polygonal oligomeric silsesquioxane derivative, and 5 to 30 parts by weight of a compound generating acid by light, based on 100 parts by weight of a polyamide derivative.

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Patent Owner(s)

Patent Owner	Address
KOREA KUMHO PETROCHEMICAL CO LTD	KUMHO ASIANA MAIN TOWER 115 SINMUNNO 1-GA JONGNO-GU SEOUL 110-857

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor Name	Address	# of filed Patents	Total Citations
Kang, Seok Chan	Daegu, KR	5	3
Lee, Jin Han	Incheon, KR	18	118

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Positive typed photosensitive composition

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United States of America Patent

12869002

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PATENT NO	8318401
APP PUB NO	20110183115A1
SERIAL NO	12869002
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
November 27, 2012	US,8318401,B2 US8318401B2	GRANTED PATENT AS SECOND PUBLICATION
July 28, 2011	US,20110183115,A1 US20110183115A1	FIRST PUBLISHED PATENT APPLICATION

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12869002

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