Photosensitive compound and photosensitive composition including the same
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United States of America Patent
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Nov 27, 2012
Grant Date -
Mar 3, 2011
app pub date -
Dec 30, 2009
filing date -
Aug 31, 2009
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
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