Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector

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United States of America

PATENT NO 8324598
SERIAL NO

13399560

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Abstract

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In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baas, Gerardus Wilhelmus Petrus Weert, NL 4 109
Gommeren, Gregory Micha Wouw, NL 3 162
Haast, Marc Antonius Maria Eindhoven, NL 10 140
Kemper, Petrus Wilhelmus Josephus Maria Waalre, NL 5 90
Moest, Bearrach Eindhoven, NL 35 288
Nanver, Lis Karen Zoetermeer, NL 5 288
Nihtianov, Stoyan Eindhoven, NL 24 498
Pot, Martijn Den Ham, NL 3 162
Sarubbi, Francesco Delft, NL 3 162
Scholtes, Thomas Ludovicus Maria Dordrecht, NL 4 218
Schuwer, Antonius Andreas Johannes Waalwijk, NL 3 107
Van, Der Sijs Arie Johan Veldhoven, NL 6 177

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