Dielectric mesh isolated phase change structure for phase change memory
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United States of America Patent
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Dec 4, 2012
Grant Date -
Apr 8, 2010
app pub date -
Oct 2, 2008
filing date -
Oct 2, 2008
priority date (Note) -
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Abstract
A method for manufacturing a memory device, and a resulting device, is described using silicon oxide doped chalcogenide material. A first electrode having a contact surface; a body of phase change memory material in a polycrystalline state including a portion in contact with the contact surface of the first electrode, and a second electrode in contact with the body of phase change material are formed. The process includes melting and cooling the phase change memory material one or more times within an active region in the body of phase change material without disturbing the polycrystalline state outside the active region. A mesh of silicon oxide in the active region with at least one domain of chalcogenide material results. Also, the grain size of the phase change material in the polycrystalline state outside the active region is small, resulting in a more uniform structure.
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