Methods for producing omni-directional multi-layer photonic structures
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United States of America Patent
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Dec 11, 2012
Grant Date -
Aug 19, 2010
app pub date -
Feb 19, 2009
filing date -
Feb 19, 2009
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Abstract
A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
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