Production of high purity silicon from amorphous silica
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United States of America Patent
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Dec 25, 2012
Grant Date -
Mar 3, 2011
app pub date -
Aug 25, 2010
filing date -
Aug 25, 2009
priority date (Note) -
Expired
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Abstract
A process to the production of silicon from amorphous silica is disclosed. The amorphous silica is formed from a material rich in silica, especially rice husk ash or silica fume. The process comprises subjecting the amorphous silica to leaching with a lixiviant of aqueous mineral acid, especially hydrochloric acid. Preferably, material rich in silica is roasted at a temperature of not more than 850° C., subjected to leaching and then subjected to a second roasting at a temperature of less than 750° C. The process provides for the production of high purity silicon, especially to the production of solar grade silicon (SoG-Si).
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