Apparatus for ejecting fluid onto a substrate and system and method incorporating the same

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United States of America Patent

PATENT NO 8343287
APP PUB NO 20110214700A1
SERIAL NO

13104580

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of processing a substrate. In one embodiment, the invention can be a method of processing a substrate comprising: supporting the substrate in a horizontal orientation; rotating the substrate; providing a fluid dispensing apparatus adjacent a surface of the substrate, the fluid dispensing apparatus comprising a body having an outer surface and a first conduit terminating as a first hole in the outer surface of the body and a second conduit terminating as a second hole in the outer surface of the body, the first hole oriented at a non-normal angle relative to the substrate and offset a first radial distance from a rotational center-point of the substrate; and ejecting liquid out of the first hole into contact with the substrate at the rotational center-point and ejecting liquid out of the second hole into contact with the substrate at a second radial distance from the rotational center-point.

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Patent Owner(s)

Patent OwnerAddress
NAURA AKRION INC6330 HEDGEWOOD DRIVE SUITE 150 ALLENTOWN PA 18106

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hahn, Christopher Huntington Beach, US 18 316
Lee, Hanjoo Paju, KR 10 104

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