Self calibration methods for optical analysis system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 1, 2013
Grant Date -
Dec 24, 2009
app pub date -
Mar 10, 2006
filing date -
Nov 28, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Disclosed is a system and methodologies for providing self-calibration in an optical analysis system. Illumination light is directed toward a material to be sampled while provisions are made to modify the characteristics of at least a portion of the illumination light falling on a reference detector. The modified characteristics may include light presence and/or spectral characteristics. Light presence may be modified by rotating or moving mirror assemblies to cause light to fall on either a sample detector or a reference detector while spectral characteristics may be modified by placing materials having known spectral characteristics in the path of the illumination light.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully