Vacuum processing apparatus

United States of America Patent

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Jan 8, 2013
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Apr 8, 2010
app pub date
Oct 14, 2009
filing date
Feb 4, 2005

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Expired

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Abstract

Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.

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Patent Owner	Address
ADVANCED DISPLAY PROCESS ENGINEERING CO LTD	GYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor Name	Address	# of filed Patents	Total Citations
Choi, Jun Young	Seoul, KR	103	402
Han, Myung-Woo	Seoul, KR	9	106
Kim, Gyeong-Hoon	Anyang-shi, KR	8	423
Kim, Hyung-Soo	Seoul, KR	112	661
Lee, Jeong-Bin	Yongin, KR	7	85
Lee, Young Jong	Sungnam-shi, KR	48	311
Son, Hyoung-Kyu	Gangbuk-gu, KR	8	53

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Vacuum processing apparatus

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United States of America Patent

12578864

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PATENT NO	8349082
APP PUB NO	20100086382A1
SERIAL NO	12578864
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 08, 2013	US,8349082,B2 US8349082B2	GRANTED PATENT AS SECOND PUBLICATION
April 08, 2010	US,20100086382,A1 US20100086382A1	FIRST PUBLISHED PATENT APPLICATION

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12578864

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