Field-effect device and manufacturing method thereof

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United States of America Patent

PATENT NO 8354710
APP PUB NO 20100032749A1
SERIAL NO

12188774

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Abstract

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Embodiments relate to a field-effect transistor that includes a body region, a first source/drain region of a first conductivity type, a second source/drain region of the first conductivity type, and a pocket implant region adjacent to the first source/drain region, the pocket implant region being of a second conductivity type, wherein the second conductivity type is different from the first conductivity type. The body region physically contacts the pocket implant region.

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Patent Owner(s)

Patent OwnerAddress
INFINEON TECHNOLOGIES AG85579 NEUBIBERG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baghini, Maryam Shojaei Mumbai, IN 6 228
Gossner, Harald Riemerling, DE 109 2390
Rao, Ramgopal Mumbai, IN 43 2054
Shrivastava, Mayank Mumbai, IN 41 716

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