Crystalline film devices, apparatuses for and methods of fabrication
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United States of America Patent
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Jan 22, 2013
Grant Date -
Jan 15, 2009
app pub date -
Apr 28, 2008
filing date -
May 3, 2007
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Abstract
Methods of depositing thin film materials having crystalline content are provided. The methods use plasma enhanced chemical vapor deposition. According to one embodiment of the present invention, microcrystalline silicon films are obtained. According to a second embodiment of the present invention, crystalline films of zinc oxide are obtained. According to a third embodiment of the present invention, crystalline films of iron oxide are obtained.
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