Low temperature amorphous silicon sacrificial layer for controlled adhesion in MEMS devices

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United States of America Patent

PATENT NO 8358458
APP PUB NO 20110051224A1
SERIAL NO

12939909

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Abstract

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Methods of fabricating an electromechanical systems device that mitigate permanent adhesion, or stiction, of the moveable components of the device are provided. The methods provide an amorphous silicon sacrificial layer with improved and reproducible surface roughness. The amorphous silicon sacrificial layers further exhibit excellent adhesion to common materials used in electromechanical systems devices.

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Patent Owner(s)

  • SNAPTRACK, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chung, Wonsuk San Jose, US 39 534
Tu, Thanh Nghia San Jose, US 3 28
Webster, James Randolph San Jose, US 14 392
Yan, Xiaoming Sunnyvale, US 14 220

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