Scanner based optical proximity correction system and method of use
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United States of America Patent
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Jan 29, 2013
Grant Date -
Mar 4, 2010
app pub date -
Jan 16, 2008
filing date -
Jan 18, 2007
priority date (Note) -
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Abstract
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns for an integrated circuit is compared against the simulated, corrected reticle design. A determination is made as to whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (δ1) is less than a predetermined criteria (ε1). The technique further includes completing the model the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria.
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