Plasma measurement device, plasma system, and method for measuring plasma characteristics
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United States of America Patent
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Feb 5, 2013
Grant Date -
Jan 6, 2011
app pub date -
Jan 27, 2010
filing date -
Jul 3, 2009
priority date (Note) -
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Abstract
A plasma measurement device used for measuring plasma characteristics of radio frequency plasma a probe, a connector electronic wire, and a power supply device. The probe is used for entering the radio frequency plasma to measure the plasma characteristics. One end of the connector electronic wire is electrically connected to the probe. The power supply device is electrically connected to another end of the connector electronic wire, and the power supply device is used for providing a voltage to the probe. The connector electronic wire is a specific length, and the connector electronic wire and the radio frequency plasma would generate a standing wave effect. Thus, according to the standing wave effect, the plasma measurement device could eliminate high-frequency interference generated by the radio frequency plasma while measuring the plasma characteristics.
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