Micro shutter device and method of manufacturing the same
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United States of America Patent
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Feb 5, 2013
Grant Date -
Jun 10, 2010
app pub date -
Aug 11, 2009
filing date -
Dec 9, 2008
priority date (Note) -
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Abstract
A micro shutter device and a method of manufacturing the micro shutter device are provided. A transparent substrate is provided. A barrier is formed on the substrate to partition a unit pixel. A pattern layer is formed with a transparent material to have a transparent first pattern portion on the substrate in the unit pixel. A movable plate is arranged to face the pattern layer, has an opaque second pattern layer corresponding to a shape of the first pattern portion, and is configured to transmit light therethrough except the second pattern portion. An actuator is for moving the movable plate. Therefore, light leakage due to diffraction can be prevented, resulting in increasing contrast ratio and improving light efficiency.
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