Position detector, position detection method, exposure apparatus, and device manufacturing method
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United States of America Patent
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Feb 5, 2013
Grant Date -
Apr 30, 2009
app pub date -
Oct 1, 2008
filing date -
Oct 31, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
A position detector, which detects the position of a mark formed on a substrate (W), comprises a creating unit (9), a search unit (13), and a correction unit (14). The creating unit (9) creates a template used for identifying a mark to be detected (WM) based on an image including the mark (WM). The search unit (13) searches an image by using the template created by the creating unit (9), and determines whether there is a pseudo pattern, other than the pattern of the mark (WM), whose degree of matching with the template is higher than a reference value. The correction unit (14) corrects the template based on the information of the pseudo pattern when it is determined that there is the pseudo pattern, and creates a corrected template whose degree of matching with the pseudo pattern is lower than the reference value.
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