Quasi-annular reflective electron patterning device

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United States of America Patent

PATENT NO 8373144
SERIAL NO

12873158

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Abstract

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One embodiment relates to an electron-beam apparatus for writing a pattern on a target substrate. The apparatus includes a plurality of arrays of actively-controlled pixel elements at a surface of a reflective electron patterning device. The plurality of arrays of actively-controlled pixel elements are arranged so that there is an area without any actively-controlled pixel elements in a region surrounding an optical axis of the objective lens. The plurality of arrays may be arranged to each lie on a circle centered on the optical axis. Other features, aspects and embodiments are also disclosed.

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Patent Owner(s)

  • KLA-TENCOR CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carroll, Allen San Jose, US 5 348
McCord, Mark A Los Gatos, US 61 481
Petric, Paul F Pleasanton, US 21 356

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