Method of forming inorganic insulating layer and method of fabricating array substrate for display device using the same
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United States of America Patent
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Feb 19, 2013
Grant Date -
Jan 22, 2009
app pub date -
Dec 31, 2007
filing date -
Jul 20, 2007
priority date (Note) -
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Abstract
A method of forming an inorganic insulating layer on a substrate comprises supplying a mixed gas between the substrate and a target, and generating a plasma between the substrate and the target. The target comprises a silicon-based material. The method further comprises depositing a plurality of ions from the plasma on the substrate.
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