Spinous process implants, instruments, and methods
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United States of America Patent
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Feb 26, 2013
Grant Date -
Mar 3, 2011
app pub date -
Aug 10, 2009
filing date -
Jan 11, 2007
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Spinous process implants and associated methods are shown and described. In one aspect, the implant limits the maximum spacing between the spinous processes. In another aspect, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect, an implant includes a spacer and separate extensions engageable with the spacer. The spacer is provided in a variety of lengths and superior to inferior surface spacings. In another aspect, an implant includes a spacer and a cerclage element offset from the midline of the spacer in use so that the spacer defines a fulcrum and the cerclage element is operative to impart a moment to the vertebrae about the spacer. In another aspect, instrumentation for inserting the implant is provided. In other aspects, methods for treating spine disease are provided.
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