Vaporizer and semiconductor processing system

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8382903
APP PUB NO 20070079760A1
SERIAL NO

11543086

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Abstract

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A vaporizer for generating a process gas from a liquid material includes a container defining a process space of the vaporizer, and an injector having a spray port configured to spray the liquid material in an atomized state downward in the container. A lower block is disposed below the spray port inside the container such that a run-up space for the atomized liquid material is defined between the spray port and the lower block, and an annular space continuous to the run-up space is defined between an inner surface of the container and the lower block. First and second heaters are respectively provided to the container and the lower block, and configured to heat the atomized liquid material flowing through the annular space to generate the process gas. A gas delivery passage is connected to the container to output the process gas from the annular space.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325
SOKEN-INDUSTRIES1-103-55 YOSHINODAI KAWAGOE SAITAMA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Okabe, Tsuneyuki Kai, JP 50 1149
Okura, Shigeyuki Kofu, JP 17 101
Ujiie, Kazuo Kawasaki, JP 4 38

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