Chromeless phase-shifting photomask with undercut rim-shifting element
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United States of America Patent
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Mar 5, 2013
Grant Date -
Aug 11, 2011
app pub date -
Feb 9, 2010
filing date -
Feb 9, 2010
priority date (Note) -
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Abstract
A phase-shifting photomask with a self aligned undercut rim-shifting element and methods for its manufacture are provided. One embodiment of the invention provides a method of manufacturing a phase-shifting photomask having a self aligned rim-shifting element, the method comprising: applying a patterning film to a first portion of a transparent substrate; etching the substrate to a depth to remove a second portion of the substrate not beneath the patterning film; etching the first portion of the substrate to undercut an area beneath the patterning film; and removing the patterning film, wherein the etched substrate forms a self-aligned undercut rim-shifting element.
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