Optical imaging writer system
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United States of America Patent
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Mar 5, 2013
Grant Date -
Oct 18, 2012
app pub date -
Oct 4, 2010
filing date -
Sep 23, 2008
priority date (Note) -
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Abstract
System and method for processing image data between adjacent imaging areas in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying an overlapping region between adjacent imaging areas to be imaged by corresponding SLMs, determining a stitching path for merging the adjacent imaging areas in the overlapping region in accordance with a set of predetermined cost functions, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel using the stitching path.
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