Spectral purity filters for use in a lithographic apparatus
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United States of America Patent
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Mar 5, 2013
Grant Date -
Jan 28, 2010
app pub date -
Jul 9, 2009
filing date -
Jul 11, 2008
priority date (Note) -
Expired
status (Latency Note)
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Abstract
According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.
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