Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
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United States of America Patent
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Mar 5, 2013
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N/A
app pub date -
Jul 13, 2012
filing date -
Jun 4, 2008
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Abstract
A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
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