Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 8395755
APP PUB NO 20090284720A1
SERIAL NO

12506808

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Abstract

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A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burghoorn, Jacobus Haelen, NL 22 264
De, Jager Pieter Willem Herman Rotterdam, NL 83 1212
George, Richard Alexander Son en Breugel, NL 5 54
Gui, Cheng-Qun Best, NL 55 482
Van, Leeuwen Robbert Edgar Eindhoven, NL 14 63

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