Cleaning method for a process of liquid immersion lithography
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United States of America Patent
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Apr 2, 2013
Grant Date -
Mar 10, 2011
app pub date -
May 3, 2010
filing date -
Oct 31, 2005
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Abstract
Problem: To provide a cleaning liquid and a cleaning method having excellent leaning capability. In a process of liquid immersion lithography, they can preventing the damage to be caused by the component released from the photoresist to photoexposure devices; the waste treatment is easy; the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the production cost is reduced not detracting from the throughput in semiconductor production.
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