Importance

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Abstract

A recirculation system of a substrate support on which a semiconductor substrate is subjected to a multistep process in a vacuum chamber, the system comprising a substrate support having at least one liquid flow passage in a base plate thereof, an inlet and an outlet in fluid communication with the flow passage, a supply line in fluid communication with the inlet, and a return line in fluid communication with the outlet; a first recirculator providing liquid at temperature T₁ in fluid communication with the supply line and the return line; a second recirculator providing liquid at temperature T₂ in fluid communication with the supply line and the return line, temperature T₂ being at least 10° C. above temperature T₁; a pre-cooling unit providing liquid at temperature T_pc connected to the inlet and the outlet, temperature T_pc being at least 10° C. below T₁; a pre-heating unit providing liquid at temperature T_ph connected to the inlet and the outlet, temperature T_ph being at least 10° C. above T₂; a controller operable to selectively operate valves of the recirculation system to recirculate liquid between the flow passage and the first recirculator, the second recirculator, the pre-cooling unit or the pre-heating unit.

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First Claim