Silicon carbide, sapphire, germanium, silicon and pattern wafer polishing templates holder
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United States of America Patent
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Apr 9, 2013
Grant Date -
Feb 16, 2012
app pub date -
Aug 13, 2010
filing date -
Aug 13, 2010
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A template for polishing Silicon Carbide, Sapphire, Germanium, Silicon and pattern wafers having a slurry inlet, channels, outlets and pockets for holding said wafers terminating in peripheral vacuum ports in order to facilitate an efficient flow of slurry over the semiconductor wafers during a polishing process.
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