Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator
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United States of America Patent
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Apr 9, 2013
Grant Date -
Oct 28, 2010
app pub date -
Apr 22, 2010
filing date -
Apr 27, 2009
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Abstract
A resist composition including a base material component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates acid upon exposure,
- the acid generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below:
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