Radiation source, lithographic apparatus and device manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8416391
APP PUB NO 20110134405A1
SERIAL NO

12809427

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Abstract

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A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banine, Vadim Yevgenyevich Deurne, NL 222 2976
Soer, Wouter Anthon Nijmegen, NL 60 261
Van, Herpen Maarten Marinus Johannes Wilhelmus Heesch, NL 136 1028

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