Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition

United States of America Patent

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Apr 23, 2013
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Jun 21, 2007
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Dec 21, 2006
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Dec 21, 2005

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Abstract

A photosensitive composition containing a compound having a specific structure as described in the specification, a pattern-forming method using the photosensitive composition and the compound having a specific structure used in the photosensitive composition.

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Patent Owner	Address
FUJIFILM CORPORATION	TOKYO

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Inventor Name	Address	# of filed Patents	Total Citations
Kanda, Hiromi	Haibara-gun, JP	50	897
Wada, Kenji	Haibara-gun, JP	117	1931

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Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11642540

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PATENT NO	8426101
APP PUB NO	20070141512A1
SERIAL NO	11642540
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 23, 2013	US,8426101,B2 US8426101B2	GRANTED PATENT AS SECOND PUBLICATION
June 21, 2007	US,20070141512,A1 US20070141512A1	FIRST PUBLISHED PATENT APPLICATION

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11642540

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